| Brand Name: | aa&ss |
| Model Number: | DHX-CQ/10 |
| MOQ: | 1 set |
| Price: | $10,000 to $20,000 per set |
| Payment Terms: | L/C,T/T |
| Supply Ability: | 2 sets/month |
10 t/d EO electrochemical wastewater treatment equipment for semiconductor wafer fabrication, chip packaging & testing, auxiliary facilities wastewater treatment
Quick Details
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Semiconductor Wastewater Treatment Equipment |
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AC 200~400V WIDE VOLTAGE INPUT OPTIONAL |
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Equipment power 3.5-170 kW optional |
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Pollutant Removal Rate:50-100% |
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Semiconductor wastewater can all be treated |
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Operation without adding any chemical agents |
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The equipment only uses electricity |
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Skid-mounted equipment |
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Small footprint |
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Ready-to-use, flexible operation time based on wastewater quality |
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Unattended, fully automatic operation, simple maintenance |
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Customizable on demand |
Semiconductor wastewater is a highly representative and challenging effluent generated by high-tech industries such as integrated circuit and chip manufacturing. It features complex water characteristics, a wide variety of pollutants, and extremely stringent treatment standards. This type of wastewater is typically not from a single source but comprises multiple segregated streams with vastly different properties: fluoride-containing wastewater (from etching and cleaning processes, with extremely high fluoride ion concentrations), acid/alkali wastewater (using large amounts of nitric acid, hydrofluoric acid, ammonia, etc.), grinding/CMP wastewater (containing nano-scale silicon powder, abrasive particles, and surfactants), organic wastewater (containing photoresist, developer solutions, organic solvents like DMSO, IPA, etc.), and heavy metal-containing wastewater (potentially containing copper, lead, tin, etc.). The core treatment difficulties lie in: pollutants, while not necessarily at extremely high concentrations, are highly toxic and complex in composition, with frequent water quality fluctuations. Furthermore, the final effluent must meet very low ion concentration and conductivity requirements to achieve high-percentage reuse or comply with discharge limits stricter than conventional standards. The traditional combined process of "segregated pretreatment + biological treatment + membrane treatment" often faces bottlenecks when dealing with highly toxic organic solvents and complexed heavy metals, including risks of biological unit failure, severe membrane fouling, high operational costs, and challenges in the ultimate disposal of concentrate streams.
Addressing the core challenges of semiconductor wastewater—"diverse and complex composition, strong toxicity and inhibition, and extremely high purity requirements"—the CQDHX SERIES EO Electrochemical Oxidation Equipment, developed and manufactured by our company (AA&SS AQUA HITECH CO., LTD.), plays an irreplaceable role in treating refractory organic wastewater and complex heavy metal wastewater. Through electrocatalysis, the equipment generates highly oxidizing free radicals that can effectively decompose complex macromolecular organic compounds like photoresist and organic solvents, breaking their cyclic structures and achieving direct mineralization. Simultaneously, the electrochemical process can alter the valence states and forms of heavy metal ions, creating conditions for their subsequent removal. Its outstanding clean operation advantage is: the entire oxidation/reduction process does not rely on the addition of any chemical agents, avoiding the introduction of new impurity ions—a critical factor for the semiconductor industry, which pursues ultrapure water. Moreover, its reaction pathway does not generate additional chemical sludge, significantly reducing the burden and secondary pollution risks associated with hazardous waste disposal.
Fluoride-containing wastewater requires separate pretreatment via chemical precipitation with calcium salts to reduce fluoride ion concentrations to low levels; grinding/CMP wastewater requires coagulation-sedimentation to remove suspended solids; acid/alkali wastewater requires neutralization and adjustment; heavy metal wastewater requires reduction/precipitation pretreatment. After various pretreatments, the wastewater can enter the electrochemical enhanced treatment stage. The EC Electrochemical Equipment can efficiently capture residual colloidal particles, some heavy metal ions, phosphates, and organic matter in the wastewater, and possesses certain demulsification and decolorization capabilities, providing high-quality feed water assurance for subsequent advanced oxidation and desalination/reuse units.
Subsequently, targeting the refractory organic pollutants in the combined wastewater (such as residual photoresist and solvents), the wastewater enters the deep oxidation and detoxification stage led by the CQDHX SERIES EO Electrochemical Oxidation Equipment. Electrochemical advanced oxidation technology will efficiently decompose persistent organic compounds that are difficult to treat by conventional methods, effectively reducing TOC (Total Organic Carbon) and COD, and eliminating their biological toxicity. This step is crucial for ensuring the stable operation of subsequent membrane systems, preventing organic fouling, and achieving high water quality standards. Finally, the effluent after deep electrochemical treatment enters the membrane technology (e.g., reverse osmosis, ion exchange) and reuse system.
Through the CQDHX SERIES EO Electrochemical Oxidation Equipment independently developed by our company, operating in a clean mode that introduces no new impurities and generates no chemical sludge, the most challenging issue of toxic organic compounds in the wastewater is efficiently resolved. This provides key assurance for the long-term stable operation of downstream membrane systems and the safe compliance of final product water quality, strongly supporting the green manufacturing and sustainable development of the semiconductor industry.
For wastewater with special characteristics or unique treatment objectives, our company's engineers provide technical support and solutions.
Technical specifications for 10 tons/day wastewater treatment capacity
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Equipment Model |
DHX-CQ/10 |
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Electrode Model |
CQ-350-10-3 |
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Number of Electrodes |
10 sets |
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Input Voltage |
AC200-400V |
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Power Supply Efficiency |
≥85% |
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Frequency Range |
50-60Hz |
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Operating Voltage |
DC3-15V |
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Operating Current |
2000-2750A |
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Operating Time |
0.1-24h/day |
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Operating Temperature |
1-80℃ |
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Influent COD |
1000-50000mg/L |
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COD Removal Rate |
50-100% |
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Pipe Connection Size |
DN50 |
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Equipment Net Weight |
900kg |
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Equipment Dimensions |
3.5x2.5x1.7m |
Precautions:
Application Scope:
Etching and cleaning fluoride-containing wastewater, etching and polishing heavy metal wastewater, photolithography and developing organic wastewater, cleaning and developing acid/alkali wastewater, grinding (CMP) wastewater, etc.
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Main pollutants in semiconductor wastewater: organic compounds, heavy metal ions, acidic and alkaline substances, fluorides, suspended solids, etc.
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时间Time |
COD |
COD去除率 |
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0 |
24530 |
0.00% |
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1 |
18360 |
25.15% |
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2 |
13540 |
44.80% |
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3 |
10680 |
56.46% |
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4 |
8277 |
66.26% |
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5 |
6471 |
73.62% |
![]()
Main pollutants in semiconductor wastewater: organic compounds, heavy metal ions, acidic and alkaline substances, fluorides, suspended solids, etc.
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|
Time |
COD |
COD Removal Rate |
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0 |
6893 |
0.00% |
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1 |
4771 |
30.78% |
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2 |
2272 |
67.04% |
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3 |
1806 |
73.80% |
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4 |
1159 |
83.19% |
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5 |
617 |
91.05% |
![]()
Main pollutants in semiconductor wastewater: organic compounds, heavy metal ions, acidic and alkaline substances, fluorides, suspended solids, etc.
![]()
|
Time |
COD |
COD Removal Rate |
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0 |
24830 |
0.00% |
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1 |
12570 |
49.38% |
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2 |
2558 |
89.70% |
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3 |
1354 |
94.55% |
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4 |
301 |
98.79% |
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5 |
0 |
100.00% |
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Semiconductor Wastewater Treatment Process
Semiconductor comprehensive wastewater
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Pretreatment System (Optional)
(Improves the efficiency of the electrochemical oxidation system)
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CQDHX SERIES EO Electrochemical Oxidation Equipment
(Chelate-breaking for heavy metals, degradation of photoresist/organic solvents, fluoride removal, degradation of COD)
↓
Discharge or membrane separation followed by reuse
Process 2
Semiconductor comprehensive wastewater
↓
Pretreatment System (Optional)
(Improves the efficiency of the electrochemical oxidation system)
↓
EC ELECTROCHEMICAL SYSTEM
(Chelate-breaking for heavy metals, degradation of photoresist/organic solvents, fluoride removal, degradation of COD)
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CQDHX SERIES EO ELECTROCHEMICAL OXIDATION TREATMENT EQUIPMENT
(degradation of COD)
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Discharge or membrane separation followed by reuse
Treatment Capacity of Electrochemical Oxidation Wastewater Treatment Equipment
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Unit Wastewater Treatment Capacity |
Primary Pollutants |
Pollutant Removal Rate |
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0.5-30T/h |
Toxic substances |
50-99% |
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Organic matter |
50-99% |
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Ammonia nitrogen |
30-99% |
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Color |
50-95% |
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Suspended Solids |
90-99% |