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Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers

Brand Name: aa&ss
Model Number: DHX-CQ/10
MOQ: 1 set
Price: $10,000 to $20,000 per set
Payment Terms: L/C,T/T
Supply Ability: 2 sets/month
Detail Information
Place of Origin:
China
Alias:
BDD Oxidation Equipment
Parameter:
1-30T/h
Process:
BDD
Material:
Corrosion-resistant
Application:
Removal Of Organics And Ammonia Nitrogen From Wastewater
Customized Service:
Customizable On Demand
Type:
Modular Water Treatment System
Maintenance:
Low Maintenance With Easy Access
Supply Ability:
2 sets/month
Highlight:

Semiconductor Industrial Wastewater Equipment

,

Semiconductor Industrial Water Treatment Plant

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Small Sewage Treatment Plant Manufacturers

Product Description

10 t/d EO electrochemical wastewater treatment equipment for semiconductor wafer fabrication, chip packaging & testing, auxiliary facilities wastewater treatment

Quick Details

Semiconductor Wastewater Treatment Equipment

AC 200~400V WIDE VOLTAGE INPUT OPTIONAL

Equipment power 3.5-170 kW optional

Pollutant Removal Rate:50-100%

Semiconductor wastewater can all be treated

Operation without adding any chemical agents

The equipment only uses electricity

Skid-mounted equipment

Small footprint

Ready-to-use, flexible operation time based on wastewater quality

Unattended, fully automatic operation, simple maintenance

Customizable on demand

Semiconductor wastewater is a highly representative and challenging effluent generated by high-tech industries such as integrated circuit and chip manufacturing. It features complex water characteristics, a wide variety of pollutants, and extremely stringent treatment standards. This type of wastewater is typically not from a single source but comprises multiple segregated streams with vastly different properties: fluoride-containing wastewater (from etching and cleaning processes, with extremely high fluoride ion concentrations), acid/alkali wastewater (using large amounts of nitric acid, hydrofluoric acid, ammonia, etc.), grinding/CMP wastewater (containing nano-scale silicon powder, abrasive particles, and surfactants), organic wastewater (containing photoresist, developer solutions, organic solvents like DMSO, IPA, etc.), and heavy metal-containing wastewater (potentially containing copper, lead, tin, etc.). The core treatment difficulties lie in: pollutants, while not necessarily at extremely high concentrations, are highly toxic and complex in composition, with frequent water quality fluctuations. Furthermore, the final effluent must meet very low ion concentration and conductivity requirements to achieve high-percentage reuse or comply with discharge limits stricter than conventional standards. The traditional combined process of "segregated pretreatment + biological treatment + membrane treatment" often faces bottlenecks when dealing with highly toxic organic solvents and complexed heavy metals, including risks of biological unit failure, severe membrane fouling, high operational costs, and challenges in the ultimate disposal of concentrate streams.

Addressing the core challenges of semiconductor wastewater—"diverse and complex composition, strong toxicity and inhibition, and extremely high purity requirements"—the CQDHX SERIES EO Electrochemical Oxidation Equipment, developed and manufactured by our company (AA&SS AQUA HITECH CO., LTD.), plays an irreplaceable role in treating refractory organic wastewater and complex heavy metal wastewater. Through electrocatalysis, the equipment generates highly oxidizing free radicals that can effectively decompose complex macromolecular organic compounds like photoresist and organic solvents, breaking their cyclic structures and achieving direct mineralization. Simultaneously, the electrochemical process can alter the valence states and forms of heavy metal ions, creating conditions for their subsequent removal. Its outstanding clean operation advantage is: the entire oxidation/reduction process does not rely on the addition of any chemical agents, avoiding the introduction of new impurity ions—a critical factor for the semiconductor industry, which pursues ultrapure water. Moreover, its reaction pathway does not generate additional chemical sludge, significantly reducing the burden and secondary pollution risks associated with hazardous waste disposal.

Fluoride-containing wastewater requires separate pretreatment via chemical precipitation with calcium salts to reduce fluoride ion concentrations to low levels; grinding/CMP wastewater requires coagulation-sedimentation to remove suspended solids; acid/alkali wastewater requires neutralization and adjustment; heavy metal wastewater requires reduction/precipitation pretreatment. After various pretreatments, the wastewater can enter the electrochemical enhanced treatment stage. The EC Electrochemical Equipment can efficiently capture residual colloidal particles, some heavy metal ions, phosphates, and organic matter in the wastewater, and possesses certain demulsification and decolorization capabilities, providing high-quality feed water assurance for subsequent advanced oxidation and desalination/reuse units.

Subsequently, targeting the refractory organic pollutants in the combined wastewater (such as residual photoresist and solvents), the wastewater enters the deep oxidation and detoxification stage led by the CQDHX SERIES EO Electrochemical Oxidation Equipment. Electrochemical advanced oxidation technology will efficiently decompose persistent organic compounds that are difficult to treat by conventional methods, effectively reducing TOC (Total Organic Carbon) and COD, and eliminating their biological toxicity. This step is crucial for ensuring the stable operation of subsequent membrane systems, preventing organic fouling, and achieving high water quality standards. Finally, the effluent after deep electrochemical treatment enters the membrane technology (e.g., reverse osmosis, ion exchange) and reuse system.

Through the CQDHX SERIES EO Electrochemical Oxidation Equipment independently developed by our company, operating in a clean mode that introduces no new impurities and generates no chemical sludge, the most challenging issue of toxic organic compounds in the wastewater is efficiently resolved. This provides key assurance for the long-term stable operation of downstream membrane systems and the safe compliance of final product water quality, strongly supporting the green manufacturing and sustainable development of the semiconductor industry.

For wastewater with special characteristics or unique treatment objectives, our company's engineers provide technical support and solutions.

Technical specifications for 10 tons/day wastewater treatment capacity

Equipment Model

DHX-CQ/10

Electrode Model

CQ-350-10-3

Number of Electrodes

10 sets

Input Voltage

AC200-400V

Power Supply Efficiency

85%

Frequency Range

50-60Hz

Operating Voltage

DC3-15V

Operating Current

2000-2750A

Operating Time

0.1-24h/day

Operating Temperature

1-80

Influent COD

1000-50000mg/L

COD Removal Rate

50-100%

Pipe Connection Size

DN50

Equipment Net Weight

900kg

Equipment Dimensions

3.5x2.5x1.7m

Precautions:

  1. The equipment must be installed in a well-ventilated, rain-sheltered, non-explosion-proof area.
  2. The equipment power supply uses a three-phase five-wire system, and the equipment must be reliably grounded.
  3. Do not strike the electrodes with hard objects.

Application Scope:

Etching and cleaning fluoride-containing wastewater, etching and polishing heavy metal wastewater, photolithography and developing organic wastewater, cleaning and developing acid/alkali wastewater, grinding (CMP) wastewater, etc.

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers 0

Main pollutants in semiconductor wastewater: organic compounds, heavy metal ions, acidic and alkaline substances, fluorides, suspended solids, etc.

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers 1

时间Time
h

COD
mg/L

COD去除率
CODremovalrate

0

24530

0.00%

1

18360

25.15%

2

13540

44.80%

3

10680

56.46%

4

8277

66.26%

5

6471

73.62%

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers 2

Main pollutants in semiconductor wastewater: organic compounds, heavy metal ions, acidic and alkaline substances, fluorides, suspended solids, etc.

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers 3

Time
h

COD
mg/L

COD Removal Rate

0

6893

0.00%

1

4771

30.78%

2

2272

67.04%

3

1806

73.80%

4

1159

83.19%

5

617

91.05%

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers 4

Main pollutants in semiconductor wastewater: organic compounds, heavy metal ions, acidic and alkaline substances, fluorides, suspended solids, etc.

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers 5

Time
h

COD
mg/L

COD Removal Rate

0

24830

0.00%

1

12570

49.38%

2

2558

89.70%

3

1354

94.55%

4

301

98.79%

5

0

100.00%

Semiconductor Industrial Wastewater Equipment , Small Sewage Treatment Plant Manufacturers 6

Semiconductor Wastewater Treatment Process

Process 1

 

Semiconductor comprehensive wastewater

Pretreatment System (Optional)

(Improves the efficiency of the electrochemical oxidation system)

CQDHX SERIES EO Electrochemical Oxidation Equipment
(Chelate-breaking for heavy metals, degradation of photoresist/organic solvents, fluoride removal, degradation of COD)

Discharge or membrane separation followed by reuse

 

Process 2

 

Semiconductor comprehensive wastewater

Pretreatment System (Optional)

(Improves the efficiency of the electrochemical oxidation system)

EC ELECTROCHEMICAL SYSTEM

(Chelate-breaking for heavy metals, degradation of photoresist/organic solvents, fluoride removal, degradation of COD)

CQDHX SERIES EO ELECTROCHEMICAL OXIDATION TREATMENT EQUIPMENT

(degradation of COD)

Discharge or membrane separation followed by reuse

Treatment Capacity of Electrochemical Oxidation Wastewater Treatment Equipment

Unit Wastewater Treatment Capacity

Primary Pollutants

Pollutant Removal Rate

0.5-30T/h

Toxic substances

50-99%

Organic matter

50-99%

Ammonia nitrogen

30-99%

Color

50-95%

Suspended Solids

90-99%